tabulus-runs / ALD /README.md
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Atomic Layer Deposition (ALD)

Recorded Tabulus experiment artifacts for the Atomic Layer Deposition corpus.

Papers

  • Cremers_2019/ — Cremers, Puurunen & Dendooven (2019), Conformality in atomic layer deposition: Current status overview of analysis and modelling. DOI: 10.1063/1.5060967
  • Miikkulainen_2013/ — Miikkulainen et al. (2013), Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends. DOI: 10.1063/1.4757907
  • Puurunen_2005/ — Puurunen (2005), Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process. DOI: 10.1063/1.1940727

Each paper directory follows the same Step 1–7 organization described in the top-level README.md. Adapter-specific subdirectories preserve the actual execution granularity of the recorded runs.